|
(April 29, 2008) Munich, GERMANY — SUSS Microtec and Philips Research, Eindhoven, Netherlands, announced a license agreement to develop an enabling technology called substrate conformal imprint lithography (SCIL). The intention is to bring existing equipment platform with additional nanoimprinting (NIL) feature to the market, enabling new approaches to large-area imprint applications.
"SCIL represents an enabling new technology that paves the way forAfurther commercialization of nanoimprint lithography", said Rolf Wolf, general manager of SUSS MicroTec lithography division. "This collaboration with Philips Research significantly broadens the range of nanoimprint lithography processes we can offer our customers."
This imprint technology for sub-50 nm patterning is expected to bridge the gap between small rigid stamp application for best resolution and large-area soft stamp usage with the usual limited printing resolution below 200 nm. According to SUSS Microtec, SCIL offers the best of both worlds; large-area soft stamps with repeatable sub-50nm printing capability, avoiding stamp deformation as no contact force is applied, non-UV based curing at room temperature and allowing high aspect ratios even up to 1:5 and more.
The lab aligner platform from SUSS MicroTec, handling the 150 and 200 mm UV-lithography like MA6 and MA8, will be available and upgradeable with this feature. Immediate availability for sampling is given with the current test setup. Market introduction with fully implemented SCIL functionality into SUSS lab aligners is scheduled for later this year.
For more on lithography applications for 3D packaging, be sure to attend the webcast, Advances in 3D Packaging: Focus on Lithography, tomorrow, April 30, 2008 at 1:00 pm EDT, sponsored by SUSS Microtec.
| 
Web Exclusives 
Add RSS Feed
