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THE WEEKLY WRAP FROM WAFERNEWS

WaferNews is published weekly by PennWell. To request a free sample issue or to receive subscription information, please forward requests to Christine Tourgee, WaferNews, 98 Spit Brook Rd., Nashua, NH 03062; Tel: 603-891-9174; Fax: 603-891-0574.

Looking for Funding? China May Be a Good Place to Set Up Shop
Acquiring VC funding in the post dot com era is nothing short of challenging. However, there are ways to convince investors to part with their cash, and having a manufacturing facility already running in China is a good place to start.

Substrate Technologies Inc. (STI), Carrollton, TX, a provider of IC packaging solutions, completed its latest round of funding, gleaming $25 million from the likes of Merrill Lynch, Carson Private Capital, and Marubeni Corp.

In addition to the funding, STI has blazed a path into China and brought on a new chairman and CEO, Jeffrey Davis, who has manufacturing experience and experience in running factories worldwide.

STI entered Shenzhen, China, in 2000 with construction of its manufacturing facility. The factory came on-line in late 2001, and currently supports a monthly production output of 30,000 24-in. x 18-in. panels, or five million 35mm substrates. With several incremental equipment additions, total capacity may be expanded to 60,000 panels/month creating a total monthly output of 10 million 35mm substrates.

STI's facility in China made it easier for investors to spend money on the company, according to its co-founder and CFO Clay Deniger.

"You read every day about companies that have great investors with deep pockets but there is too much uncertainty," Deniger told WaferNews. "But investors knew where we stood in terms of China. We have a loyal and engaged group of investors that have passed on other portfolio investors - it was given to us based on progress."

Deniger said that the company knew very early on that it needed to be in Asia. "Not only because of labor," he said, "but also because that is where the rest of the infrastructure is, and that is where subcontractors are, and where the customers want you."

After identifying an operating partner with experience starting factories and operating them in China, STI set out to "go away from the places where someone else was building a different product with a similar process."

Dengier said that while STI wanted workers with experience, the company wanted its processes to be the only specific experience of the laborers, so they didn't inherit the mistakes of previous employers.

In China, STI has been focused on the efficiencies of operating at high volume. As an added plus, STI found that it is cost effective to run at low volumes as well because "you're only carrying labor and something to keep manufacturing a go."

The company enjoys a skilled labor market, and a location that is free of similar packaging facilities. "There was some advantage differentiating ourselves. People see that as a benefit."

By adding Davis to the management team, STI gained a senior executive who will focus on "the blocking and tackling of the manufacturing business," Deniger said. Davis' focus is on details like dealing with problems that occur when a factory is ramped up or transitioning out of development. He will also focus on sales and marketing with the goal of becoming a true operating company.

Founded in 1998, STI has grown from a two-person start-up R&D company, founded by Deniger and co-founder and CTO Abram Castro (both from Amkor) into a company which provides:


  • The Ultra BGA, a thin cavity-down thermally enhanced ball grid array package;
  • The Ultra MCM, which is offered as a multi-chip package solution when high thermal and electrical performance is needed. Its structure is comparable to the Ultra BGA but with multiple die cavities;
  • The Ultra Flip Chip, which provides a cavity-down package to address the demanding electrical and thermal requirements of next generation silicon; and
  • The Ultra Ball Frame, which applies STI's expertise in thermally enhanced substrates to a near chip scale package.

While the company currently has no concrete plans for building or expanding, it does have its eye on the future. Going IPO had been in the plans as of two years ago, but the company is not counting on that now. Deniger was open to many additional possibilities - IPO, a strategic partner, perhaps being acquired. STI currently has 33 employees at its Dallas, TX, facility and 175 employees in China.
--Rachel Robinson, Associate Editor
(November 21)

At IDF: Manufacturing -- Viva La Differentiator
While some are questioning whether profitability can still be found in semiconductor manufacturing, Intel believes that manufacturing capabilities are a differentiator and advantage as the industry continues the drive to 300mm production and the 90nm node.

Mark Bohr, Intel fellow and director of process architecture and integration, credits tightly coupled teams with ensuring that manufacturing profitability is achievable.

"It's the close-working relationships between product design, process development, and manufacturing that are key ... the foundry can't match this kind of internal teamwork," says Bohr.

Internal teams are able to decide on the technology targets and then, once in production, tweak the process and procedures.

"Intel can tune its processes ... but the foundry has to manufacture a greater variety of products - you can't fine tune all of those."

He also believes that controlling all the pieces is where the profits are.

Because the company went through the 300mm learning curve on its 0.13-micron process, its 90nm process will be implemented exclusively on 300mm wafers; the lead product will be the Prescott processor. About 75% of the toolsets used on 300mm/0.13-micron will be used for Intel's 90nm process. "These tools have already been debugged and the ramp to 90nm will be easier," comments Bohr.

The 90nm process is expected to be ramped to high volume at the company's D1C fab and then transferred to other 300mm fabs in 2003.

Having selected a carbon-doped oxide material for its low-k dielectric at the 90nm node, Bohr states that the results indicate an 18% reduction in capacitance vs. FSG or SiOF used at the 0.13-micron node. He does not anticipate having to change the material in the near future.

Those in the industry waiting to see when Intel will switch to SOI should not hold their breath. Regarding the decision to use strained Si for its 90nm process instead of SOI, Bohr notes that it will probably always be used, but new features will be needed for future generations. According to a presentation authored by Bohr, strained silicon presents no detriments involving transistor short channel behavior or junction leakage (see www.intel.com). But there is an increase in electron and hole mobility in transistor channels resulting in a 10 to 20% increase in transistor current flow (i.e., drive current).

In other developments at the Intel Developer Forum held in San Jose, CA, Sept. 10 - 12, the company said it would announce details of improved performance and scalability achieved on its experimental tri-gate transistor at the ISSDM conference in Japan on Sept. 17. With respect to next-generation lithography, Sunlin Chou, senior VP & GM of Intel's technology and manufacturing group, believes that EUV will become a commercial reality in the next few years.

During his IDF keynote, he pointed out that the EUV LLC demonstrated with its prototype tool that it could print 50nm lines and convinced suppliers of its viability. Now, he said, suppliers are investing their own money in the technology. He further emphasized that EUV mask technology breakthroughs were achieved: defect density has been reduced by approximately 100X and mask repair is also advancing.
--Debra Vogler, Technical Editor
(November 14)

IBM Exec Outlines Technical Challenges, Possible Solutions at Albany Symposium
A year ago, on Sept. 10 at the Albany Symposium on Global Nanotechnology, IBM's John Kelly III made a few predictions about recovery, growth, and the future of the semiconductor industry. A day later, his points were made largely moot by the events of 9-11-01.

Serving as the opening speaker at this year's symposium, Kelly, senior VP and group executive of IBM's technology group, noted that things do tend to change, remarking that a year ago, the Dow stood at what seemed to be a low of 9,600 plus change - a good number, compared to today's roughly 8,600.

"I'm pleased IBM has remained number one - some things never change," Kelly quipped, drawing a chuckle from the roughly 260 audience members gathered at Lake George, NY, for the prestigious conference.

Kelly went on to outline two main issues: Key technology challenges and differentiators between tomorrow's winners and losers.

The first technology challenge Kelly described was in the lithography field. While he considered the previous main challenge to be "the light bulb"- the source - today's main issue has shifted to masks and maskmaking, he explained. At 130nm, a cutting-edge mask costs upward of $1 million, and problems increase at X-ray wavelengths. IBM is beginning to look beyond masks, to nanotech-based maskless lithography systems, remarked Kelly. Specifically, IBM is working with co-polymers which self-select, self-sort, and self-assemble to create sub-10nm features - no light, no mask is used.

"We realized that with a number of materials, Mother Nature works in our favor to align, separate, and create patterns," explained Kelly. "Mother Nature has given us a lot of knobs to turn and a lot of materials to work in this regime."

However, IBM also maintains its own captive mask shop - one of two main IDMs to do so, along with Intel - a decision made several years ago, said Kelly. If IBM plans to remain a high-end, high-value chipmaker, it needs its own mask house, he explained, "a critical point of distinction." The only place IBM can get <130nm, leading-edge masks is at IBM's Vermont-based mask house, he asserted.

The second technical challenge involves transistor performance, said Kelly, as the old laws of scalability are coming to limits of what physics allow, and companies are turning to "tricks" of SOI, strained Si, 3-D devices, and nanotubes.

"As we shrink, we're getting less and less return for those dimensions," he said.

Kelly said he's amused by industry players who five years ago (when IBM first announced work with copper interconnect) said copper wouldn't work, then later said there's no benefit to copper, and then, finally, said they invented copper interconnects.

The same thing's happening with strained Si and other advanced materials, he said. Still, he added, even with all the materials tricks devised so far, there are real issues ahead at 50nm. "We've reached the point where the energy we're using when the device is turned off is as great as when it's on," he said, illustrating the problem with leakage. IBM is beginning to look at nanotubes to solve leakage problems, and "we are getting some very clean transistor behavior out of these devices."

Interconnects remain a technical challenge, Kelly said, and the issue involves more the liner material used with copper than the copper itself. Putting liner on porous materials will be "a major challenge," he said.

In fact, Kelly asserted that very few companies are in the early stages of dielectric production, and that we're "only seeing the tip of the iceberg in problems with low-k."

Kelly stressed a need to further research copper, looking into impurities and grain structure. The industry will be dealing with copper for a decade or more, he predicted, and these problems have to be solved or "they will stop us."

Design complexity is an increasing technical issue, becoming a massive problem for the industry, said Kelly, giving rise to an interesting new class of problems that exist in the boundary between design and process. These problems include signal integrity/noise, yield, power, and test.

Issues of signal integrity are becoming a larger issue with some of IBM's leading-edge customers, he noted, "particularly on critical timing paths."

Yield problems come at the interaction of a design and the process. Because the technology has advanced so quickly, designers don't understand well enough the issues and techniques used in deposition, printing, etch, etc., and the problem will worsen as the process accelerates. Design tools, methodology, and debugging haven't kept up with the process technology, he asserted.

The future winners will be companies that reach out to design houses and offer design support - something Kelly said he's seeing customers request more often.

Other winners will be companies that focus a business plan on one of two things - either providing a product differentiated by high customer value and high technological profit, or those who provide a commodity product, at low customer cost and low technological profit. The industry, he said, will bifurcate along those lines, and woe be to the company that tries to cover all the bases.

"If a company chooses to exist anywhere but in the upper right corner or lower left corner, you will be challenged significantly for existence [see illustration]," he said.

Successful companies will be tightly coupled with their customers in growth segments, and there will be a growing need for R&D partnerships.

"The largest companies in this industry can't solve these problems alone - we need more and more collaboration," he said.

Kelly also gave some mention to industry drivers, pointing mostly to grid and autonomic computing as key technologies. Grid computing refers to using the Internet backbone to link computational power of various machines. Work is being done on this in Great Britain, and the US national labs are also driving research in this area. Autonomic computing refers to systems in the grid that can self-heal, and monitor other computers in the grid and help them heal when issues arise, too.

There's also a lot of activity in pervasive computing, said Kelly, wherein a home will be full of devices that connect over the Internet and share resources.

But, he cautioned, a lot has to happen to see these things come to pass. In particular, he mentioned continued work is needed on:


  • LINUX/open source
  • Open middleware standards
  • Wireless standards
  • Fiber bandwidth evolution
  • Powerful devices linked to backend infrastructure
  • Security
  • The "last mile"
  • Data storage/processing standards (XML).

"This is your prayer list, if you will," he said.
--Matt Wickenheiser, Editor
(November 7)

APC Gains Traction; e-Manufacturing Next
For years chipmakers have talked about automatic process control (APC). Now that a wafer may cost more than a new BMW, they are putting their money where their mouth is. Evolving control strategies for all levels, from individual processes to fabwide optimization with fault detection at each step, are being explored at the AEC/APC Symposium in Snowbird, UT, this week.

Keynoter Brian Harrison, Intel VP and GM of fab/sort manufacturing, said that every wafer Intel processes now has feedforward and feedback control of CDs (critical dimensions) based on CD/SEM data. Dynamic adjustment of etch time compensates for measured variation, and feedback is used for dose control in lithography for the next wafer. CD variation in high-performance microprocessors can cause some chips to run slower, making them worth hundreds of dollars less.

Harrison cited some other major benefits of APC at Intel. Rework has been reduced over 50%, and it takes half the headcount to maintain the same quality for 130nm production as it does for 180nm wafers. He added a long list of other benefits, including productivity, better Cpk, device performance, speed matching, and more precise control of processes. Wafer values shoot way up going to 130nm and beyond, Harrison pointed out, so a major increase in APC applications is planned.

Fault detection classification and analysis is a major target for future APC applications, but the problems are complex. Some variations can be tracked to a single cause, but many are dependent on a wide range of other variables. Multivariate analysis is done successfully in other industries. Joe Qin, U. of Texas, Austin, did a survey for AMD and found 4,600 applications, mostly in the chemical, refining, and other process industries as well as aerospace, with the most complex involving a matrix of 64X25 variables.

"In a refinery a defect is more forgiving," Qin said, since the misprocessed fluid can be used for something else. "But in a wafer fab, you throw the wafer away."

In the push for quick results, some fabs are tackling the univariate problem now while working on multivariate solutions for the future. At Infineon's fab in Regensburg, Germany, for example, Peter Hoehmann reported on a pragmatic approach to managing APC for fault detection control (FDC). He estimated more than a billion data points are gathered each month in the fab, which makes logic and power devices. A covariance matrix is set up for each tool, with correlations and deviations, resulting in a single number. Setting up the matrix isn't easy, Hoehmann explained. Decisions have to be made about which deviations are relevant or significant, and this takes engineering judgment. A tool is observed for about a week to build an effective model.

"About 80% of process deviation is univariate," he believes, so major advances can be made without dealing with the 20% that are multivariate. These are complex and hard to interpret.

Interest is rising in e-Manufacturing, an approach to integrated fabwide control, reported Harvey Wohlwend of International SEMATECH.

"We've had standing room only sessions with 50 plus attendees at our meetings at recent SEMICONs," Wohlwend said.

SEMATECH and Selete in Japan have worked jointly on equipment engineering guidelines, which are now on the SEMATECH website, along with the e-diagnostics guidebook 1.4 (www.sematech.org/public/resources/ediag/index.htm). There will be a vote in October on security interfaces for e-diagnostics, he noted.

Much work remains to be done, Wohlwend suggested, not just in agreeing on standards, but also in getting interoperable software and in getting better, more accurate, and complete data from tools. While standards committees are working toward agreement on interfaces and frameworks, chipmakers such as Intel and Texas Instruments already have developed their own fab-level architectures, he agreed in response to a question. He said that different architectures were expected, but emerging standards will help provide more commercial solutions that are interoperable. Right now, one speaker suggested, 80% of the money spent on fab software is for proprietary systems, which slows development, creates duplication of effort, and makes interfacing more difficult.

A major driver for APC is 300mm wafer processing. Intel's second 300mm commercial production plant, FX11, is ramping up in New Mexico and two more are being constructed, Intel's Harrison reported. A 300mm plant provides Intel with 2.4X die/wafer, 30% lower cost/die, and 40% less water and energy consumption. To make them work efficiently, Harrison said, "e-Manufacturing is a must."

"We need delivery of some lagging 300mm standards," he urged, citing ones for process management (E40), control job (E94), and substrate tracking (E90).

The difficulty of establishing an automated FDC system in existing fabs, using SECS/GEM interfaces, was cited by Elfido Coss of AMD. The company's vision for a FDC system is not one database (DB), but many DBs in a data storage component managed by a data broker. An analysis engine, possibly with several external analysis engines, would have links to a classification engine. Built in would be business rules in the fab, such as who should be contacted, whether there is a need to wake someone up, or whether work on a lot should stop immediately.

The FDC will act like a traffic cop, Coss explained, linking users and suppliers of data through filters. Both synchronous and asynchronous communication will be needed, but commercial data brokers don't allow asynchronous links, he complained.

Many added sensors and additional capabilities will be needed to make such an automated FDC feasible, so AMD needs to build the infrastructure from the ground up, Coss explained. This can't be imposed on an existing fab so it is a goal for new fabs, he said.
--Bob Haavind, Editorial Director
(October 31)

Semico: Mild US Recession, Still Positive on China
Semico Research Corp. started its recent forecast workshop emphasizing that it is not in the double-dip camp and it projects 30% revenue growth (17% unit growth) for semiconductors in 2003.

Another downturn is expected in 2005 due to 300mm capacity coming on board in China and a lull in PC and cell phone upgrades, since the replacement cycle will have taken place in the 2003 to 2004 timeframe.

Comparing economic data from previous US recessions, Semico notes that the current US recession is mild. The worst recession since 1960 occurred from 1973 to 1975 - it lasted 16 months and the real GDP was -3.40% with a peak unemployment rate of 9%. The next worst recession was in 1981 to 1982 - it too lasted 16 months; the real GDP was -2.90% and the peak unemployment rate was 10.8%. The 2001 recession was nine months long, had a real GDP of 0.3% and a peak unemployment rate of 6.1%.

Semico sees some indicators in Japan improving. Thanks to its auto industry selling more to Europe and the US, and providing electrical devices and general machinery to Asia, the country has an export surplus. Korea also has a better economic outlook, driven by a 20% increase in exports during the first seven months of 2002, especially in consumer goods and communications. Europe, however, is still going through difficult times with unemployment in Germany hovering at 10%, and in the UK unemployment is at 5.5% for 2002.

Looking at the differences between IDMs and foundries, Semico Senior Analyst Joanne Itow notes that because most IDMs will not build 300mm or 100nm-capable fabs, by 2006 foundries will provide over 40% of the wafers manufactured at 180-, 130-, and 100nm technologies.

Itow does not believe that China's foundries will pose much of a threat to those in Taiwan for several more years. She also predicts that foundries will see a healthy growth from the communications market between now and 2006: from a 16.3% year-over-year growth rate in 2002 to a projected 22.5% by 2006. In contrast, the computers segment represents a 41.7% year-over-year growth rate in 2002 and is expected to decline to 29.7% by 2006.

In marked contrast to the gloomy outlook on China presented at last month's SEMI forecast luncheon, Semico is still keen on the country. Jim Feldhan, president of Semico, notes that there is an underlying fundamental that cannot be stopped - the priority the country places on education. As an educated populace becomes more aware of the possibilities at its feet, its wants and desires tend to increase. He expects the trend to pick up momentum as more and more people return to China - part of the country's re-patriation program. "This is a normal progression from an agrarian to an industrial culture," explains Feldhan. "This movement has started and is now nearly impossible to stop."

Regarding China's lagging edge semiconductor technology - now at 0.25-micron and larger - Feldhan believes the situation will change. "TI will be sending partially processed 0.13-micron wafers to China for final processing - this will be a learning experience," says Feldhan. He does allow that China needs to do a better job at protecting IP, and until that happens, he thinks the flow of IP to the country will probably be slower than it could be.

Feldhan further notes that the Chinese government is spending billions to upgrade its infrastructure. One such example is that of ON Semiconductor - the plant had a sub-standard road leading to its plant and the government built a six-lane highway to it. "As the Chinese economy develops, there will be growing pains," states Feldhan. "Corporate and personal failures will occur, but for every failure you can find several success stories."
--Debra Vogler, Technical Editor
(October 24)

China Gearing Up for IT Manufacturing
China is becoming a better market for selling high tech gear, but at the same time it is building a foundation to become a formidable competitor to the world's leading high tech nations, especially in IT manufacturing. These were the major messages of Dan Brody, China representative for the US Information Technology Office, at a special program on China markets at SEMICON West.

The value-added tax (VAT) has dropped from 17% to 6% as China enters the World Trade Organization, Brody pointed out. Its foreign trade of about $550 billion a year makes it seventh among trading nations, with a GDP of about $1.1 trillion compared to $10 trillion for the US. In 2001, China took the world lead in cell phone users at 166 million, but that growth is now slowing, reaching 176 million users in June, 2002, Brody said, as the market begins to saturate. He predicted that the cell phone market there is poised for overcapacity and price wars.

Meanwhile, however, China is becoming a major assembler of high tech products. IT manufacturing should grow 20% per year for the next five years, Brody predicted, rising from $181 billion in 2002 to $302 billion in 2005. PC manufacturing is rising in China, and this year the Chinese expect to export 750,000 PCs, when none were exported last year. He suggested that the world's PC vendors should start to be afraid, "... very afraid!" he added.

Television manufacturers in China are building about 40 million sets/year, 30 million for the domestic market, and 10 million to be "dumped" in the US, since the European Union has very high tariffs, Brody stated. There are hundreds of thousands of workers in this industry, Brody said, and if the trade were shut down, almost all jobs in entire cities would be lost.

Out of some $16 billion of semiconductors used in China, more than 80% were imports, with only about $2 billion worth made in China. That should change dramatically over the next few years, he suggested, with domestic production reaching 30% by 2005 and 50% by 2010. One sign of the impending change is the rise of IC design firms.

"A year ago there were 30 to 40 design houses," Brody explained, "Now there are 240 to 250 of them, many with managers from Taiwan or returnees from other foreign countries."

Right now, he added, the firms are mostly very small, with only five companies having revenues of more than $12 million.

At SMIC, with 2,400 employees, about a third are from overseas, with Fab 1 and Fab 2 in production and Fab 3 being built. SMIC plans to take advantage of government efforts to bring more chipmaking to the Beijing area by borrowing up to $600 million for a factory there. The government will give them $15 million, and other companies will put in another $200 million, with SMIC investing over $300 million, he said.

Foundry services are also rising in China, Brody said, with NEC Hua Hong in Shanghai, for example, going from 30% foundry operations currently to 50% by the end of the year as it exits the DRAM business.

While COCOM is gone, licensing of exports of process tools and equipment to China are still required in the US under the Wassenaar multilateral agreement among 33 nations, according to Bernard Kritzer, director of the US Office of Strategic Trade & Foreign Policy Controls. While semiconductor manufacturing offers a big growth market for industry, there is concern about diversion to military uses, he explained. Last year, of about 1,300 license applications, some 72% were approved, he said.

A lack of enough information was often the reason for disapproval. National Security Export Controls apply to semiconductor manufacturing equipment, and licenses are considered case-by-case without any predetermined limits on feature sizes or wafer diameters. Requests to export equipment aimed at military end uses will be denied, he indicated, and sometimes the vendor may be unaware that intelligence throws suspicion on the parties buying the equipment.

Each vendor is responsible for knowing the regulations, Kritzer said, and the rules are updated constantly. They are on the office's website at www.bis.doc.gov. While our trading partners in Europe and Japan also follow the same procedures, their licensing is much faster than in the US, he said, so efforts are being made to shorten the application review, which now averages about 74 days for China versus an average of 44 days for other countries, such as India.

There is an annual review of the Wassenaar rules, and semiconductor manufacturing equipment should get much higher priority, Kritzer pointed out, as the fab/foundry market grows in China.
--Bob Haavind, Editorial Director
(October 17)





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